Seguir
Steven A. Vitale
Steven A. Vitale
Senior Technical Staff, MIT Lincoln Laboratory
Dirección de correo verificada de ll.mit.edu
Título
Citado por
Citado por
Año
Liquid droplet dispersions formed by homogeneous liquid− liquid nucleation:“The Ouzo Effect”
SA Vitale, JL Katz
Langmuir 19 (10), 4105-4110, 2003
5302003
Manufacturing a semiconductive device using a controlled atomic layer removal process
SA Vitale
US Patent 7,494,882, 2009
4132009
Valleytronics: opportunities, challenges, and paths forward
SA Vitale, D Nezich, JO Varghese, P Kim, N Gedik, P Jarillo‐Herrero, ...
Small 14 (38), 1801483, 2018
3152018
Silicon etching yields in and HBr high density plasmas
SA Vitale, H Chae, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19 (5 …, 2001
1472001
Ultra-compact nonvolatile phase shifter based on electrically reprogrammable transparent phase change materials
C Ríos, Q Du, Y Zhang, CC Popescu, MY Shalaginov, P Miller, C Roberts, ...
PhotoniX 3 (1), 26, 2022
1412022
FDSOI process technology for subthreshold-operation ultralow-power electronics
SA Vitale, PW Wyatt, N Checka, J Kedzierski, CL Keast
Proceedings of the IEEE 98 (2), 333-342, 2010
1362010
Work-function-tuned TiN metal gate FDSOI transistors for subthreshold operation
SA Vitale, J Kedzierski, P Healey, PW Wyatt, CL Keast
IEEE Transactions on Electron Devices 58 (2), 419-426, 2010
1272010
Plasma–surface kinetics and simulation of feature profile evolution in etching of polysilicon
W Jin, SA Vitale, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (6 …, 2002
1152002
Multi‐level electro‐thermal switching of optical phase‐change materials using graphene
C Ríos, Y Zhang, MY Shalaginov, S Deckoff-Jones, H Wang, S An, ...
Advanced Photonics Research 2 (1), 2000034, 2021
922021
Reduction of silicon recess caused by plasma oxidation during high-density plasma polysilicon gate etching
SA Vitale, BA Smith
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2003
912003
Progress toward diamond power field‐effect transistors
MW Geis, TC Wade, CH Wuorio, TH Fedynyshyn, B Duncan, ME Plaut, ...
physica status solidi (a) 215 (22), 1800681, 2018
812018
Low-thermal-budget synthesis of monolayer molybdenum disulfide for silicon back-end-of-line integration on a 200 mm platform
J Zhu, JH Park, SA Vitale, W Ge, GS Jung, J Wang, M Mohamed, T Zhang, ...
Nature Nanotechnology 18 (5), 456-463, 2023
582023
Method of simultaneously siliciding a polysilicon gate and source/drain of a semiconductor device, and related device
F Mehrad, S Yu, SA Vitale, JG Tran
US Patent 7,727,842, 2010
492010
Etching chemistry of benzocyclobutene (BCB) low-k dielectric films in and high density plasmas
SA Vitale, H Chae, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (6 …, 2000
492000
Etching of organosilicate glass low-k dielectric films in halogen plasmas
SA Vitale, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 20 (3 …, 2002
452002
Effect of surface roughness and H–termination chemistry on diamond's semiconducting surface conductance
T Wade, MW Geis, TH Fedynyshyn, SA Vitale, JO Varghese, DM Lennon, ...
Diamond and Related Materials 76, 79-85, 2017
442017
Silicon dioxide etching yield measurements with inductively coupled fluorocarbon plasmas
H Chae, SA Vitale, HH Sawin
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (2 …, 2003
402003
The effect of a carbon-carbon double bond on electron beam-generated plasma decomposition of trichloroethylene and 1, 1, 1-trichloroethane
SA Vitale, K Hadidi, DR Cohn, P Falkos
Plasma Chemistry and Plasma Processing 17, 59-78, 1997
321997
Transient tap couplers for wafer-level photonic testing based on optical phase change materials
Y Zhang, Q Zhang, C Ríos, MY Shalaginov, JB Chou, C Roberts, P Miller, ...
ACS Photonics 8 (7), 1903-1908, 2021
282021
Chemical and semiconducting properties of NO2-activated H-terminated diamond
MW Geis, TH Fedynyshyn, ME Plaut, TC Wade, CH Wuorio, SA Vitale, ...
Diamond and Related Materials 84, 86-94, 2018
242018
El sistema no puede realizar la operación en estos momentos. Inténtalo de nuevo más tarde.
Artículos 1–20